Raith PIONEER TWO is a compact yet versatile electron beam system for uncompromised sub-10 nm lithography and ultra high resolution imaging by scanning electron microscopy. The electron optics offers unsurpassed low voltage inspection even below 1 keV. It is equiped with a highly precise laser interferometer controlled stage enabling high quality results in exposures, which require excellent pattern placement, stitching and overlay performance. It also includes and additional InLens special detector for imaging and mark recognition.