Clean atmosphere cabinet for electronic devices processing

Vertical laminar flow cabin model AV30/70 from Telstar equipped with a spin coater SUSS LabSpin6 BM Bench mounted system for two-inch wafers or small rectangular substrates. Speed: 100 - 8.000 rpm, acceleration 4.000 rpm/sec and spinning time: 1 s up to 999 s

Technical Manager

Ángel López Muñoz

Scientific Officer

Eugenio Coronado Miralles

Group

RTMM