ICP-RIE etching

Sentech ICP-RIE 500-302 etching tool. Equipped with a vacuum load-lock for samples up to 100 mm diameter. The available gases for processing are: H2, Ar, O2, SF6, and C4F8

Technical Manager

Ángel López Muñoz

Scientific Officer

Eugenio Coronado Miralles

Group

RTMM