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Facilities, RTMM

Analizadores térmicos diferenciales y termogravimétricos (25-1100ºC)

Mettler Toledo TGA/SDTA 851e model that operates in the range 25 - 1100ºC provided with an ultramicrobalance with sensitivity of 0.1 ?g. Thermogravimetry (TGA) is a technique that measures the change in weight of a sample as it is heated or held at constant

RTMM
Calorímetro de barrido diferencial (150-500ºC)

Mettler Toledo DSC 821e model that operates in the temperature range -150 - 500ºC equipped with a liquid nitrogen cryostat and a 200W furnace supply which allows maximum heating rates of 20ºC/min. Ceramic sensor plate guarantees robustness and design

RTMM
Clean atmosphere cabinet for electronic devices processing

Vertical laminar flow cabin model AV30/70 from Telstar equipped with a spin coater SUSS LabSpin6 BM Bench mounted system for two-inch wafers or small rectangular substrates. Speed: 100 - 8.000 rpm, acceleration 4.000 rpm/sec and spinning time: 1 s up to 999 s

RTMM
Cleanroom

Cleanroom class ISO 7 with a surface of 80 m2. Several instruments are available inside: Electron-beam lithography, Laser writer optical lithography, ellipsometry, UHV evaporators, Plasma ICP-RIE dry etching, Sputtering, wire bonder and optical microscope.

RTMM
Ellipsometer

Sentech SE801 spectroscopic ellipsometer. Wavelength: 190nm -1100 nm, Xe Lamp, with fixed angle at 70 degrees.

RTMM
Evaporator in ultra-high vacuum (UHV). Metal and molecular evaporation

Evaporation system is formed for two independent UHV chambers with a base pressure of 10-10 mbar. One of them is equipped with an e-beam evaporation source, which allows the deposition of metals and metal in substrates up to 51 cm diameter. The second chamber is for molecular materials...

RTMM
Formlabs Form 3+

Formlab Form 3+ printer with LFS (Low Force Stereolithography) technology with a printing volume of 144.78 x 144.78 x 185.42 mm. It can print pieces with a resolution between 25 -300µm on the Z axis and 25µm on the XY axis in thirty different materials.

RTMM
ICP-RIE etching

Sentech ICP-RIE 500-302 etching tool. Equipped with a vacuum load-lock for samples up to 100 mm diameter. The available gases for processing are: H2, Ar, O2, SF6, and C4F8

RTMM
Langmuir trough KSV 300

Computer controlled and user programmable Langmuir and Langmuir-Blodgett (LB) instrument for automated Langmuir film experiments and for unsupervised deposition of normal multilayers onto solid substrates.

RTMM
Langmuir trough Nima 702BAM with Brewster-angle microscope

A computer controlled NIMA Langmuir trough (type 702BAM) equipped with a Wilhelmy plate can register surface pressure-area isotherms with a resolution better than 0.1 mN/m. Furthermore, the Langmuir monolayer surface is continuously imaged with 2 µm lateral resolution, during the compression...

RTMM
Total: 10
With the support of:
Ayuda CEX2019-000919-M financiada por: